I could not resist

N00DL3

Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering.
We will show how we’re using them in a DIY Electron Beam Lithography set-up and how you’re able to cook your own cheap resists and mix your own developers.

Resists? What's that?

• What are their applications


• How does it work (types (positive/negative), chemistry, proximity effect, dosage etc)

EBL? What's that?

• How does it work


• Pros & cons: comparison between EBL (slow) photolithography (fast)


• Which resist can I use for EBL

DIY cooking of PMMA based resists

• Comparison of different solvents

Composition of different developers

• Comparison of different developers

Applications

• Usage as a mask


• Usage as a structural dielectric material


• ...(?)

The EBL exposure process

• simple SEM retrofitted with an EBL controller


• The common file formats (GDSII & OASIS)


• Scan-Gen: how to generate the proper curves for the exposure


• Hardware: off-the-shelf embedded modules like the RedPitaya


• Generation of different filling curve styles, calibration, compensation of the proximity effect, correction of the SEMs intrinsic parameters, dosage!


• Fiducial detection and alignment for multi-pass/multi-layer processes

Stuff comes together

• walk through the complete process along a simple example

More Examples

Thanks & Credits

Q & A